December 2015

Influence of etching on the optical properties of a-plane-oriented ZnO epilayers grown by plasma-assisted molecular beam epitaxy

A-plane-oriented ZnO epilayers grown by plasma-assisted molecular beam epitaxy were studied with respect to their optical properties. 10K-photoluminescence (PL) and reflectivity were used to analyze various 2 µm-thick ZnO films etched at different etching profile. The PL spectra show the band emission of the structures become narrower when the etching profile increase. At 0.75 µm etching profile, two...

Author(s): Bassirou, L. O.